WB1-2

Structure-Property-Process Parameter Correlation in the Advanced MOCVD growth of 4+ µm REBCO Thick Films over 10+ m Lengths
*Mahesh Paidpilli1,2,3, Eduard Galstyan1,2,3, Goran Majkic1,2,3, Kalyan Boyina1, Vinay Shyam1, Venkat Selvamanickam1,2,3

REBCO (REBa2Cu3O7-δ) coated conductor with Je > 1000 A/mm2 at operating condition has a wide range of applications in fusion and high-field magnets. We have demonstrated short REBCO samples with Je ~ 4,600 A/mm2 (based on 0.1 mm thick tape) at 4.2 K, 20 T using Advanced metal-organic chemical vapor deposition (A-MOCVD). In order to achieve such high performance uniformly over long tapes, defective regions in thick films need to be avoided. In this work, we investigated which parameter causes dropout or variation in the critical current along the length of long tapes made by A-MOCVD. By addressing the engineering challenges of growing 4+ µm thick REBCO films in a single pass, 10+ m long tapes with high critical current that varies < 5% along the length have been fabricated.

Keywords: REBCO tapes, Defect, Microstructure, MOCVD